An apparatus for treating a wafer preferably includes a rotating chuck for rotating the wafer and a treating fluid supplying part for supplying the wafer with one or more treating fluids. The treating fluid(s) can be used to clean and/or dry the wafer. The treating fluid supplying part preferably includes...http://www.google.es/patents/US7387132?utm_source=gb-gplus-sharePatente US7387132 - Apparatus for treating wafer
