Disclosed is an exposure method comprising preparing an exposure apparatus including an illumination system and a projection lens, setting, in the exposure apparatus, a photomask having a mask pattern including a plurality of unit circuit patterns arranged like a checkered flag pattern and a plurality...http://www.google.es/patents/US6872508?utm_source=gb-gplus-sharePatente US6872508 - Exposure method and method of manufacturing semiconductor device
Exposure method and method of manufacturing semiconductor device
