Gas flow structures are described for the inputting and exhausting of gases for a continuous vapor deposition reactor to cause an even flow of gases within the reactor chamber and to prevent the deposition of reaction material on the walls of the reactor chamber. Gas inlet and exhaust port structures...http://www.google.es/patents/US4949669?utm_source=gb-gplus-sharePatente US4949669 - Gas flow systems in CCVD reactors
