A method of treating a semiconductor substrate has forming convex patterns over the semiconductor substrate by dry etching, cleaning and modifying a surface of the convex patterns by using chemical, forming a hydrophobic functional surface on the modified surface of the convex patterns, after forming...http://www.google.es/patents/US20100075504?utm_source=gb-gplus-sharePatente US20100075504 - METHOD OF TREATING A SEMICONDUCTOR SUBSTRATE
Número de solicitud: 12/574,543 Número de publicación: US 2010/0075504 A1 Fecha de presentación: 6 Oct 2009 Patente emitida: US7749909 ( Fecha de emisión 6 Jul 2010)
