A method and apparatus for improving film stability of a halogen-doped silicon oxide layer. The method includes the step of introducing helium along with the process gas that includes silicon, oxygen and a halogen element. Helium is introduced at an increased rate to stabilize the deposited layer. In...http://www.google.es/patents/US6001728?utm_source=gb-gplus-sharePatente US6001728 - Method and apparatus for improving film stability of halogen-doped silicon oxide films
Method and apparatus for improving film stability of halogen-doped silicon ...
