In a semiconductor substrate, a field effect transistor, and methods for producing the same, in order to lower threading dislocation density and also to lower surface roughness, a step of repeating, a plurality of times, a process of epitaxially growing a SiGe gradient composition layer of which a Ge...http://www.google.es/patents/US7198997?utm_source=gb-gplus-sharePatente US7198997 - Method for producing semiconductor substrate, method for producing field effect transistor, semiconductor substrate, and field effect transistor
Method for producing semiconductor substrate, method for producing field ...
