A photolithographic projection system for transferring a predetermined pattern from a photomask to a wafer includes a radiation source and a grating mask. The radiation source projects radiation along a path through the photomask toward the wafer. The grating mask is positioned along the radiation...http://www.google.es/patents/US5726741?utm_source=gb-gplus-sharePatente US5726741 - Photolithographic projection systems including grating masks and related methods
Photolithographic projection systems including grating masks and related ...
