Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection...http://www.google.es/patents/US6694284?utm_source=gb-gplus-sharePatente US6694284 - Methods and systems for determining at least four properties of a specimen
Methods and systems for determining at least four properties of a specimen
