A method of controlling deposition quality of line-of-sight and target surfaces in a plasma-enhanced chemical vapor deposition apparatus. Adhesion and integrity of deposited film on the surfaces is improved by one or more of (1) avoiding differential thermal expansion of the film and the underlying surfaces,...http://www.google.es/patents/US5368646?utm_source=gb-gplus-sharePatente US5368646 - Reaction chamber design to minimize particle generation in chemical vapor deposition reactors
Reaction chamber design to minimize particle generation in chemical vapor ...
