When a capacitor is formed on a semiconductor substrate, a lower electrode of the capacitor is first formed. After an insulating film is formed on the lower electrode, it is selectively etched until the lower electrode is exposed, and in this way, a hole portion is formed in the insulating film. After...http://www.google.es/patents/US6093575?utm_source=gb-gplus-sharePatente US6093575 - Semiconductor device and production method of a semiconductor device having a capacitor
Semiconductor device and production method of a semiconductor device having ...
