An apparatus for forming Strontium-Tantalum-Oxide films and a method thereof using an atomic layer deposition tool are provided. In the Strontium-Tantalum-Oxide films deposited by using plasma and the atomic layer deposition, its leakage-current is very low, and its dielectric constant has a range of...http://www.google.es/patents/US6486047?utm_source=gb-gplus-sharePatente US6486047 - Apparatus for forming strontium-tantalum-oxide thin film
Apparatus for forming strontium-tantalum-oxide thin film
