A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is preferably established between the precursor container and the reaction space for receiving at least...http://www.google.es/patents/US20040124131?utm_source=gb-gplus-sharePatente US20040124131 - Precursor material delivery system for atomic layer deposition
Precursor material delivery system for atomic layer deposition
Número de solicitud: 10/660,365 Número de publicación: US 2004/0124131 A1 Fecha de presentación: 10 Sep 2003 Patente emitida: US7141095 ( Fecha de emisión 28 Nov 2006)
