A method for removing particles from a surface of an article, such as a semiconductor wafer in a clean room. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away...http://www.google.es/patents/US6240931?utm_source=gb-gplus-sharePatente US6240931 - Method for removing particles from a surface of an article
Method for removing particles from a surface of an article
