The present invention relates generally to removing an undesirable second oxide, while minimally affecting a desirable first oxide, on an integrated circuit. The integrated circuit may be part of a larger system....http://www.google.es/patents/US6891245?utm_source=gb-gplus-sharePatente US6891245 - Integrated circuit formed by removing undesirable second oxide while minimally affecting a desirable first oxide
Integrated circuit formed by removing undesirable second oxide while ...