An apparatus and method for performing a cyclical layer deposition process, such as atomic layer deposition is provided. In one aspect, the apparatus includes a substrate support having a substrate receiving surface, and a chamber lid comprising a tapered passageway extending from a central portion of...http://www.google.es/patents/US7780785?utm_source=gb-gplus-sharePatente US7780785 - Gas delivery apparatus for atomic layer deposition
Gas delivery apparatus for atomic layer deposition
