In one embodiment, the system includes a gas supply assembly having a first gas source, a first gas conduit coupled to the first gas source, a first valve assembly, a reaction chamber, and a gas distributor carried by the reaction chamber. The first valve assembly includes first and second valves that...http://www.google.es/patents/US7282239?utm_source=gb-gplus-sharePatente US7282239 - Systems and methods for depositing material onto microfeature workpieces in reaction chambers
Systems and methods for depositing material onto microfeature workpieces in ...
