A method for forming nanoclusters includes providing a semiconductor substrate; forming a dielectric layer over the semiconductor substrate, exposing the semiconductor substrate to a first flux of atoms to form first nuclei on the dielectric layer, exposing the first nuclei to a first inert atmosphere...http://www.google.es/patents/US20060189079?utm_source=gb-gplus-sharePatente US20060189079 - Method of forming nanoclusters
