A method for manufacturing a semiconductor device comprises the steps of forming a semiconductor film on a substrate, oxidizing a surface of said semiconductor film in an oxidizing atmosphere with said semiconductor film heated or irradiated with light, and further depositing an oxide film on the oxidized...http://www.google.es/patents/US6465284?utm_source=gb-gplus-sharePatente US6465284 - Semiconductor device and method for manufacturing the same
Semiconductor device and method for manufacturing the same
