A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet...http://www.google.es/patents/US7522263?utm_source=gb-gplus-sharePatente US7522263 - Lithographic apparatus and method
