A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the apparatus includes a table configured to support a substrate (16); a patterning element defining a pattern...http://www.google.es/patents/US7903233?utm_source=gb-gplus-sharePatente US7903233 - Offset partial ring seal in immersion lithographic system
Offset partial ring seal in immersion lithographic system
