An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form...http://www.google.es/patents/US20060146306?utm_source=gb-gplus-sharePatente US20060146306 - Exposure apparatus, exposure method, and method for producing device
Exposure apparatus, exposure method, and method for producing device
Número de solicitud: 11/366,746 Número de publicación: US 2006/0146306 A1 Fecha de presentación: 3 Mar 2006 Patente emitida: US7932991 ( Fecha de emisión 26 Abr 2011)
