A resist processing method includes (a), to a substrate having a circuit pattern with an uneven surface formed thereon, coating a photoresist solution to, by doing so, form a photoresist film, (b) subjecting the substrate to heat processing to cause a portion of the photoresist film to be chemically...http://www.google.es/patents/US6143478?utm_source=gb-gplus-sharePatente US6143478 - Resist processing method
