A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece,...http://www.google.es/patents/US20050159082?utm_source=gb-gplus-sharePatente US20050159082 - Polishing apparatus
Número de solicitud: 11/078,495 Número de publicación: US 2005/0159082 A1 Fecha de presentación: 14 Mar 2005 Patente emitida: US7632378 ( Fecha de emisión 15 Dic 2009)
