The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce...http://www.google.es/patents/US7794544?utm_source=gb-gplus-sharePatente US7794544 - Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
Control of gas flow and delivery to suppress the formation of particles in ...
