An exposure system includes: an illumination optical system defining, in an effective illumination source plane, a center region forming a perpendicularly incident light and first and second eccentric regions forming obliquely incident lights having a perpendicular electric vector component perpendicular...http://www.google.es/patents/US7436491?utm_source=gb-gplus-sharePatente US7436491 - Exposure system, exposure method and method for manufacturing a semiconductor device
Exposure system, exposure method and method for manufacturing a ...
