A scanning electron microscope (SEM) (24), or other irradiating device, is used to create a potential in sample areas (39b) of a test structure (39) formed on the surface of an integrated circuit wafer. A conduction path between the irradiated sample area and a common area (39a) is detected via an ammeter...http://www.google.es/patents/US5053699?utm_source=gb-gplus-sharePatente US5053699 - Scanning electron microscope based parametric testing method and apparatus
Scanning electron microscope based parametric testing method and apparatus
