A lithographic apparatus includes an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed...http://www.google.es/patents/US8102504?utm_source=gb-gplus-sharePatente US8102504 - Exposure apparatus, exposure method, and method for producing device
Exposure apparatus, exposure method, and method for producing device
