An ECR type plasma processing apparatus including an airtight processing chamber and a work table for supporting a semiconductor wafer thereon disposed in the processing chamber. The interior of the processing chamber is exhausted to a vacuum by an exhaust system and an active gas such as CF.sub.4 gas...http://www.google.es/patents/US5874706?utm_source=gb-gplus-sharePatente US5874706 - Microwave plasma processing apparatus using a hybrid microwave having two different modes of oscillation or branched microwaves forming a concentric electric field
Microwave plasma processing apparatus using a hybrid microwave having two ...
