Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern....http://www.google.es/patents/US7116403?utm_source=gb-gplus-sharePatente US7116403 - Lithographic apparatus and device manufacturing method
Lithographic apparatus and device manufacturing method
