A method of manufacturing a semiconductor device whereby a photoresist layer is provided on a surface of a slice of semiconductor material, after which two photomasks corresponding to adjoining portions of a pattern to be formed in the photoresist are projected on the photoresist by means of a projection...http://www.google.es/patents/US5792591?utm_source=gb-gplus-sharePatente US5792591 - Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
Method of manufacturing a semiconductor device whereby photomasks comprising ...
