A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative...http://www.google.es/patents/US7330244?utm_source=gb-gplus-sharePatente US7330244 - Method and apparatus for performing limited area spectral analysis
Method and apparatus for performing limited area spectral analysis
