A sputtering cathode based on the magnetron principle, with a target of the material to be sputtered having a minimum of one component, with a magnetic system located beneath the target and having magnetic sources of different polarization which form a minimum of one self-enclosed tunnel of arcuate magnetic...http://www.google.es/patents/US6077407?utm_source=gb-gplus-sharePatente US6077407 - Sputtering cathode based on the magnetron principle
Sputtering cathode based on the magnetron principle
