A dry etching apparatus using reactive ions is disclosed. A housing in which a workpiece is etched is provided with a cathode electrode on which the workpiece is mounted, and an anode electrode arranged opposite the cathode electrode. An etching gas is supplied to the housing, and pressure inside of...http://www.google.es/patents/US4526643?utm_source=gb-gplus-sharePatente US4526643 - Dry etching apparatus using reactive ions
