For determining the alignment of a substrate (W) with respect to a mask (MA), a substrate alignment mark (P10), having a periodic structure, and an additional alignment mark (P11), having a periodic structure and provided in a resist layer (RL) on top of the substrate, are used. Upon illumination of...http://www.google.es/patents/US20020080365?utm_source=gb-gplus-sharePatente US20020080365 - Method of measuring alignment of a substrate with respect to a reference alignment mark
Method of measuring alignment of a substrate with respect to a reference ...
Número de solicitud: 09/940,819 Número de publicación: US 2002/0080365 A1 Fecha de presentación: 28 Ago 2001 Patente emitida: US6937334 ( Fecha de emisión 30 Ago 2005)
