An optical system is presented for use in a measurement system for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises an illuminator unit producing illuminating light to be directed to the structure...http://www.google.es/patents/US20030030822?utm_source=gb-gplus-sharePatente US20030030822 - Method and apparatus for process control in semiconductor manufacture
Method and apparatus for process control in semiconductor manufacture
Número de solicitud: 10/155,236 Número de publicación: US 2003/0030822 A1 Fecha de presentación: 28 May 2002 Patente emitida: US6806971 ( Fecha de emisión 19 Oct 2004)
