A semiconducting processing method for making electrical contacts with an active area in sub-micron geometries includes: (a) providing a pair of conductive runners on a semiconductor wafer; (b) providing insulative spacers on the sides of the conductive runners wherein adjacent spacers are spaced a selected...http://www.google.es/patents/USRE36518?utm_source=gb-gplus-sharePatente USRE36518 - Method for making electrical contact with an active area through sub-micron contact openings and a semiconductor device
Method for making electrical contact with an active area through sub-micron ...
