A method for improving the imaging performance in a photolithographic system having a pupil plane and using a phase shift mask. A portion of the pupil plane where a phase error portion of a light from the phase shift mask is located. An aperture is placed at the located portion of the pupil plane. Typically,...http://www.google.es/patents/US7098995?utm_source=gb-gplus-sharePatente US7098995 - Apparatus and system for improving phase shift mask imaging performance and associated methods
Apparatus and system for improving phase shift mask imaging performance and ...
