A method for fabricating a flash memory device is described. A plurality of gates structures are formed on a substrate and each gate structure has a gate oxide layer. A floating gate is formed on the gate oxide layer. A cap layer is formed on the floating gate, and a spacer is formed on the sidewalls...http://www.google.es/patents/US6316298?utm_source=gb-gplus-sharePatente US6316298 - Fabrication method for a flash memory device
