Chemical vapor deposition methods are used to deposit amorphous silicon-containing films over various substrates. Such methods are useful in semiconductor manufacturing to provide a variety of advantages, including uniform deposition over heterogeneous surfaces, high deposition rates, and higher manufacturing...http://www.google.es/patents/US7186630?utm_source=gb-gplus-sharePatente US7186630 - Deposition of amorphous silicon-containing films
