United States Patent
Hasegawa et al.
US006078640A [ii] Patent Number: [45] Date of Patent:
[54] X-RAY EXPOSURE APPARATUS
[75] Inventors: Takayuki Hasegawa; Takeshi
Miyachi, both of Utsunomiya, Japan
[73] Assignee: Canon Kabushiki Kaisha, Tokyo, Japan
[21] Appl. No.: 09/106,893
[22] Filed: Jun. 30, 1998
[30] Foreign Application Priority Data
Jul. 1, 1997 [JP] Japan 9-188958
Jan. 26, 1998 [JP] Japan 10-026337
[51] Int. C I. G21K 5/00
[52] U.S. CI 378/34; 250/492.2
[58] Field of Search 378/34; 250/492.2;
359/359, 366
[56] References Cited
U.S. PATENT DOCUMENTS
5,329,126 7/1994 Amemiya et al 378/34
Primary Examiner—Craig E. Church
Attorney, Agent, or Firm—Fitzpatrick, Cella, Harper &
Scinto
[57] ABSTRACT
An exposure method and apparatus for lithographically transferring a pattern of a mask onto a substrate to be exposed, wherein a detecting system detects a relative positional relation between the mask and the substrate with respect to at least a predetermined direction, a stage member changes the relative positional relation between the mask and the substrate, on the basis of the detection by the detecting system, a magnification correcting mechanism corrects a transfer magnification of the mask pattern to the substrate, a control system for the stage member corrects one of a drive amount of the stage member and a detection result of the detecting system in accordance with a positional deviation of the mask pattern attributable to the correction operation of the magnification correcting mechanism.
12 Claims, 7 Drawing Sheets
