(54) PROCESS AND DEVICE FOR PRODUCING PHOTONIC CRYSTAL, AND OPTICAL ELEMENT
(75) Inventors: Kouichi Ichimura, Yokohama (JP);
Toshiro Hiraoka, Yokohama (JP)
(73) Assignee: Kabushiki Kaisha Toshiba, Kawasaki (JP)
( * ) Notice: Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 09/667,831
(22) Filed: Sep. 22, 2000
(30) Foreign Application Priority Data
Sep. 24, 1999 (JP) 11-271378
Sep. 30, 1999 (JP) 11-280043
(51) Int. CI.7 G02F 1/03; G21K 5/10
(52) U.S. CI 359/241; 359/321; 359/586;
250/492.22
(58) Field of Search 359/241, 321,
359/586, 579; 250/492.22; 264/1.1, 437; 430/270.1; 385/5, 122; 428/105
(56) References Cited
U.S. PATENT DOCUMENTS
5,245,466 A * 9/1993 Burns et al 359/296
5,600,483 A * 2/1997 Fan et al 257/17
6,366,392 Bl * 4/2002 Tokushima 359/321
6,392,787 Bl * 5/2002 Cirelli et al 359/248
6,396,617 Bl * 5/2002 Scalora 359/248
2002/0041425 Al * 4/2002 Baba et al 359/322
2002/0051275 Al * 5/2002 Tokushima 359/241
FOREIGN PATENT DOCUMENTS
EP WO 96/36895 * 11/1996
EP WO 09/09439 * 2/1999
JP 10-059746 3/1998
JP 10-083005 3/1998
JP 10-090634 4/1998
OTHER PUBLICATIONS
Satoru et al, "Photofabrication of photonic crystal using interference of UV laser," Proc. SPIE, Optical Engineering for Sensing and Nanotechnology 99, vol. 3740, Jun. 16-18, 1999, pp. 541-544.*
Berger et al, "Photonic band gaps and holography," Journal of Applied Physics, US American Institute of Physics, New York, vol. 82, No. 1, Jul. 1, 1997, pp. 60-64.* Lerondel et al, "Porous silicon lateral superlattices," Journal of Applied Physics, US, American Institute of Physics, New York, vol. 71, No. 2, Jul. 14, 1997, pp. 196-198.*
(List continued on next page.)
Primary Examiner—Evelyn A Lester
(74) Attorney, Agent, or Firm—Obion, Spivak, McClelland,
Maier & Neustadt, PC.
There is provided a process for producing an optical element comprising a photonic crystal in which spots having different indices are arranged periodically, comprising the step of exposing an optical medium whose refractive index changes by irradiation of light or by a predetermined treatment conducted after the irradiation of light according to the intensity of the applied light to a field where light intensity changes in space at a period of the wavelength order of light and holding the optical medium for a given time, and the step of repeating at least once the step of creating another field where light intensity changes in space at a period of the wavelength order of light by shifting the optical medium. Further, by using a plurality of optical media whose refractive indices change by an external field, the refractive indices of certain two media out of these optical media are caused to be the same or about the same under a certain external field condition. By reflecting the distribution patterns that light senses under these two conditions on a desired crystal structure, shape of a lattice point and period, there can be provided an optical element and an optical demultiplexer that are capable of dynamically switching between two significantly different photonic structures by switching the external field conditions.
19 Claims, 21 Drawing Sheets
