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US006881952B2
(12) United States Patent ao) Patent No.: us 6,881,952 B2
Kim (45) Date of Patent: Apr. 19,2005
(54) RESIDUAL GAS ANALYZER OF SEMICONDUCTOR DEVICE MANUFACTURING EQUIPMENT
(75) Inventor: Seon-Woo Kim, Giheung-Eup (KR)
(73) Assignee: Samsung Electronics Co., Ltd., Suwon-si (KR)
( * ) Notice: Subject to any disclaimer, the term ol this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 10/866,755
(22) Filed: Jun. 15, 2004
(65) Prior Publication Data
US 2005/0017168 Al Jan. 27, 2005 (30) Foreign Application Priority Data
Jul. 23, 2003 (KR) 10-2003-0050460
(51) Int. CI.7 H01J 49/04; G01M 3/04
(52) U.S. CI 250/300; 250/281; 250/282;
250/299; 324/464
(58) Field of Search 250/300, 299,
250/282, 281, 288, 289, 441.11; 324/464;
73/40.7
(56) References Cited
U.S. PATENT DOCUMENTS
4,911,103 A * 3/1990 Davis et al 118/725
In semiconductor manulacturing equipment having a residual gas analyzing apparatus for analyzing the composition ol residual gas in a process chamber ol the equipment a heater ol the residual gas analyzer is interlocked with a heater ol the process chamber. The residual gas analyzer includes an ion detector, and the heater ol the residual gas analyzer has a filament and a heating jacket surrounding a portion ol the ion detector. A relay connects a power source ol the heater for the process chamber to the heater ol the residual gas analyzer. Power is supplied to and cut off Irom the heater ol the residual gas analyzer in response to heater on/off signals used for controlling the operation for the heater for the process chamber.
4 Claims, 3 Drawing Sheets
