Method and apparatus for arc plasma deposition with evaporation of reagents

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S. Anders et al., "Formation of Metal Oxides by Cathodic
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H. Bolt et al., "Gradient Metal—a-C:H Coatings Deposited
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D.E. Brodie et al., "Characterization of ZnO for the Fabrication of Conductor-Insulator-Semiconductor (CIS) Solar Cells", Conf. Proc. for IEEE 14th Photovoltaic Spec. Conf. 468-471 (Jan. 7-10, 1980).

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A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.

41 Claims, 8 Drawing Sheets

Z.-C. Jin et al., "Optical Properties of Sputter-Deposited ZnO:Al Thin Film," 64(10) /. Appl. Phys. p. 5117-5131 (1988). Nov. 15, 1988).

R.A. MacGill et al., "Cathodic Arc Deposition of Copper Oxide Thin Films", 78 Surface and Coatings Technology 168-72 (1996) no month.

S. Major et al., "Electrical and Optical Transport in Undoped and Indium-doped Zinc Oxide Films," 1(2)/. Mater. Res. p. 300-310 (Mar./Apr. 1986).

S. Maniv et al., "Transparent Conducting Zinc Oxide and Indium-Tin Oxide Films Prepared by Modified Reactive Planar Magnetron Sputtering", Al(3), /. Vac. Sci. Tech., p. 1370-1375 (Jul./Sep. 1983).

Tadatsugu Minami et al., "Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering", vol. 24, No. 10, Japenese J. of Appl. Phy., p. L781-L784, (Oct. 1985).

Tadatsugu Minmai et al., "Hightly Conductive and Transparent Silicon Doped Zinc Oxed Thin Films Prepared by RF Magnetron Sputtering", vol. 25, No. 9, Japanese J. of Appl. Phys. p. L776-L779, (Sep. 1986).

M. Miyazaki and E. Ando, "Durability Improvement of Ag-Based Low-Emissivity Coatings", 178, /. Non-Crystalline Solids p. 245-249 (1994) no month.

C. X. Qiu and I. Shih, "Tin- and Indium-Doped Zinc Oxide Films Prepared by RF Magnetreon Sputtering," 13 Solar Energy Materials, p. 75-84 (1986) No month.

S. Major et al., "Highly Transparent and Conducting Indium-Doped Zinc Oxide Films by Spray Pyrolysis", 108 Thin Solid Films p. 333-340 (1983) No month.

D. Raviendra and J.K. Sharma, "Electroless Deposition of Cadmium Stannate, Zinc Oxide, and Aluminum-Doped Zinc Oxide Films", 58 (2), /. Appl. Phys. p. 838-844 (Jul. 1985).

R.E.I. Schropp et al., "Transparent and Conductive Thin Films of ZnO for Photovoltaic Applications Prepared by RF Magnetron Sputtering", 1, Conf. Rec. of 20th IEEE Photovoltaic Spec. Conf. 273-276 (Sep. 26, 1988).

B.E. Sernelius et al., "Band-Gap Tailoring of ZnO By Means of Heavy Al Doping", vol. 37, No. 17, Physical Review B of Am. Phys. Soc, p. 10244-10248 Jun. 15, 1988.

I. Shih and C.X. Qiu, "Indium-Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering", 58(6), /. Appl. Phys, p.2400-2401 (Sep. 15, 1985).

S. Sreedhara Reddy et al., "Optical Properties of Spray Deposited ZnO Films", vol. 77, No. 12, Solid State Communications, p. 899-901 (1991) no month.

* cited by examiner