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500 0 1

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.._J..... , '" I’ " ' ' T L‘ " ‘I I j 001111101 -,1-as 1 ANODE +53 01c@7[:] 1211201000111 +610 __ 1 011111001: “I-59 5 {__£r , -I-57 3 / SUBSTRATE $55 I 00111401 FIG. 1 C 70 .__L.. K _ 79 F T ’ ” T “ _ " ' “ ” " ' L " '1 -77 70

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1 I

1 ELECTROLYTE/DIELECTRIC +73
I 4‘.

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ELECTRODE ; 71
67'{—j- CONTACT @965
} ANODE +65
5.9 1 513011201111 11-61

T _ I 04111001: 5°C
I 1 HFD7

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8 3003111411 L755
FIG. 1 D

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1 H219 RF MAGNETRON SPUTTER c/1711005 1 H221 700° ANNEAL 1 #223

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FIG. 2A (Prior Art)

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M251 I PROVIDE SUBSTRATE I #253 I DEPOSIT CATHODE come?

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I H257 DEPOSIT ELECTROLYTE FILM

I I 259

H

DEPOSIT ANODE FILM

I 251

1”‘)

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FIG. 2B

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M251 PRUWDE suBsnuJE

I 253

H L DEPOSIT CATHODE comer I dgssc DEPOSIT CATHODE FILM

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I 25"/c

r-’

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H251
PROVIDE SUBSTRATE
I H253
01160511 04111005 00111401
I £2550
DEPOSIT 04111005 1-11.11
I M257
DEPOSIT ELECTROLYI'E 111.11

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j 2500

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FIG. 2D

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